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Thermal stability of TiSi2 on ion implanted silicon

✍ Scribed by J.F. Chen; L.J. Chen; W. Lur


Book ID
113284948
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
721 KB
Volume
96
Category
Article
ISSN
0168-583X

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This work is addressed to investigate thermal stability of a thin TiSi film, that is its ability to resist degradation due to 2 heat treatments at high temperatures. The study was carried out as a function of the formation RT treatment (675-7508C) at the end of a common process flow. Sheet resistanc