Thermal stability of high-k Er-silicate gate dielectric formed by interfacial reaction between Er and SiO2 films

✍ Scribed by Sung-Yong Chang; Myeong-Il Jeong; S.V. Jagadeesh Chandra; Yong-Boo Lee; Hyo-Bong Hong; V. Rajagopal Reddy; Chel-Jong Choi

• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 265 KB
• Volume: 11
• Category: Article
• ISSN: 1369-8001
• DOI: 10.1016/j.mssp.2009.06.001