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Thermal annealing dependence of some optical properties of plasma-modified porous silicon

โœ Scribed by Be. Benyahia; N. Gabouze; L. Guerbous; Br. Mahmoudi; H. Menari


Book ID
103820320
Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
381 KB
Volume
257
Category
Article
ISSN
0169-4332

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โœ Tingting Tan; Zhengtang Liu; Hongcheng Lu; Wenting Liu; Hao Tian ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 231 KB

HfO 2 thin films have been deposited on Si substrate by radio frequency reactive magnetron sputtering. The optical and structural properties of HfO 2 thin films in relation to rapid thermal annealing (RTA) temperatures are investigated by spectroscopic ellipsometry (SE), X-ray diffraction (XRD) and