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Thermal anneal activation of defects in hydrogen plasma-treated silicon

✍ Scribed by C.W. Nam; A. Tanabe; S. Ashok

Publisher: Elsevier Science
Year: 1996
Tongue: English
Weight: 333 KB
Volume: 36
Category: Article
ISSN: 0921-5107
DOI: 10.1016/0921-5107(95)01296-6

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