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Thermal and ion irradiation stability of direct current sputtered TiN/B–C–N multilayers

✍ Scribed by Fayeulle, S.; Nastasi, M.; Lu, Y. C.; Kung, H.; Tesmer, J. R.


Book ID
125462726
Publisher
American Institute of Physics
Year
1997
Tongue
English
Weight
496 KB
Volume
70
Category
Article
ISSN
0003-6951

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A comparative study of the structural changes induced in Al/Ti and AlN/TiN multilayers by argon ion irradiation is presented. The layers were deposited on Si substrates, by ion sputtering in case of pure metals, and reactive ion sputtering in case of metal-nitrides, to a total thickness of $270 nm.