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Theoretical and experimental results of MMW plasma gratings in silicon quartz image guide technology

✍ Scribed by Th. Fickenscher; A. Schwolen


Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
168 KB
Volume
48
Category
Article
ISSN
0895-2477

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✦ Synopsis


The propagation characteristics of an optoelectronically induced plasma grating on a single moded silicon-quartz image guide are experimentally investigated at W-band frequencies and compared with theoretical results based on a transversal homogeneous plasma profile. Because of the long diffusion lengths of the silicon semiconductor considered, an optimum carrier density and, hence, an optimum optical power density is found which results in a maximum magnitude of plasma-induced grating reflection coefficient. To understand the behavior of the reflection coefficient versus charge carrier density, the variation of phase and attenuation constants as a function of carrier density in the dark and excited waveguide sections are investigated.