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The use of organosilicon polymers in multilayer plasma resist processing

✍ Scribed by J. Paraszczak; E. Babich; R. McGouey; J. Heidenreich; M. Hatzakis; J. Shaw

Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
459 KB
Volume
6
Category
Article
ISSN
0167-9317

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