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The use of negative ions to enhance beam currents at low energies in an MeV ion implanter

✍ Scribed by John P. O'Connor; Michael E. Mack; Anthony Renau; Nobuhiro Tokoro

Book ID: 113282380
Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 340 KB
Volume: 55
Category: Article
ISSN: 0168-583X
DOI: 10.1016/0168-583x(91)96163-f

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