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The thin film reactions—Mg2Si and VSi2

✍ Scribed by B.S. Lim; J.P. Stark


Book ID
102622122
Publisher
Elsevier Science
Year
1984
Weight
444 KB
Volume
32
Category
Article
ISSN
0001-6160

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Growth mechanism and optical properties
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Reactive deposition of magnesium onto a hot silicon substrate (200-5008C) does not result in any accumulation of magnesium or its silicide -the condensation coefficient of magnesium being zero. On the other hand, codeposition of magnesium with silicon at 2008C, using a magnesium-rich flux ratio, giv