The structure of Ti–Si–N superhard nanocomposite coatings: ab initio study
✍ Scribed by Xuejie Liu; Yuan Ren; Xin Tan; Shiyang Sun; Engelbert Westkaemper
- Book ID
- 113937189
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 580 KB
- Volume
- 520
- Category
- Article
- ISSN
- 0040-6090
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Elastic and anelastic properties of TiN/a-Si 3 N 4 and (Ti 1-x Al x )N/a-Si 3 N 4 superhard nanocomposite (nc) films prepared by plasma-induced chemical vapor deposition (PCVD), magnetron sputtering and vacuum arc deposition (physical vapor deposition, PVD) have been investigated by mechanical spect
3-μm thick Ti-Si-N coatings were deposited on polished X38CrMoV5 substrates by sputtering a composite Ti-Si target in Ar-N 2 reactive mixture. Oxidation tests were performed in air at 700 °C during 2 h. Whatever the silicon content in the range 0-4 at.%, no silicon containing compound was detected b