๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

The structure of chlorine gas

โœ Scribed by J.D. Sullivan; P.A. Egelstaff


Publisher
Elsevier Science
Year
1983
Tongue
English
Weight
733 KB
Volume
82
Category
Article
ISSN
0301-0104

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Chlorination of natural gas
โœ G.W Jones ๐Ÿ“‚ Article ๐Ÿ“… 1921 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 88 KB
The quenching of chlorine fluorescence i
โœ R.E. Huie; N.J.T. Long; B.A. Thrush ๐Ÿ“‚ Article ๐Ÿ“… 1976 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 322 KB

Laser induced fluorescence has been observed from the 0 3rT(O:) state of chlorine. Lifetimes have hem 19 to 208 Pa, but the radiative lifetime is too long te, bc extracted from the data. A rate mcMcbpnt of 3.2 x cm3 mol -' s'-' was measured for quenching by Cl1 or Ar, the removal process being colli

Crystal Structure of Chlorine Dioxide
โœ Dipl.-Chem. Anette Rehr; Prof. Dr. Martin Jansen ๐Ÿ“‚ Article ๐Ÿ“… 1991 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 377 KB ๐Ÿ‘ 1 views
Fabrication of high aspect ratio structu
โœ A.K. Paul; I.W. Rangelow ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 321 KB

This article reports on the development of dry etching technology which will offer the potential to fabricate high aspect ratio structures in silicon for Micro Electro Mechanical Systems (MEMS) fabrication, using chlorine chemistry. In this study, we report about our investigations on the etching me