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The relationship between electromigration-induced short-circuit and open-circuit failure times in multi-layer VLSI technologies : J. R. Lloyd and J. A. Knight. Proc. IEEE Reliab. Phys. Conf. 48 (1984)


Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
263 KB
Volume
25
Category
Article
ISSN
0026-2714

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