The relationship between deposition conditions, the beta to alpha phase transformation, and stress relaxation in tantalum thin films

✍ Scribed by Clevenger, L. A.; Mutscheller, A.; Harper, J. M. E.; Cabral, C.; Barmak, K.

• Book ID: 121513631
• Publisher: American Institute of Physics
• Year: 1992
• Tongue: English
• Weight: 992 KB
• Volume: 72
• Category: Article
• ISSN: 0021-8979
• DOI: 10.1063/1.352059