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The properties of aluminum thin films sputter deposited at elevated temperatures: M Inoue et al,J Vac Sci Technol,A6, 1988, 1636–1639

Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 150 KB
Volume: 39
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(89)90770-7

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📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 157 KB