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The preparation of organic light-emitting diode encapsulation barrier layer by low-temperature plasma-enhanced chemical vapor deposition: a study on the\(\hbox {SiO}_\mathrm{x}\hbox {N}_\mathrm{y}\)film parameter optimization

✍ Scribed by Kuo, Chung-Feng Jeffrey; Lan, Wei-Lun; Chang, Yu-Cheng; Lin, Kun-Wei


Book ID
125362579
Publisher
Springer US
Year
2014
Tongue
English
Weight
594 KB
Volume
27
Category
Article
ISSN
0956-5515

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