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The photodissociation of phenylsilane at 193 nm

✍ Scribed by J.E. Baggott; H.M. Frey; P.D. Lightfoot; R. Walsh

Publisher: Elsevier Science
Year: 1986
Tongue: English
Weight: 451 KB
Volume: 125
Category: Article
ISSN: 0009-2614
DOI: 10.1016/0009-2614(86)85148-x

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✦ Synopsis

Molecular hydrogen is observed to be one of the major primary products in the 193 nm photodissociation of phenylstlane. A two-channel dissociation mechanism is proposed, yielding PhSiH + H, and SiH, + PhH with the former predominant. The implications of this observation for experiments which utilise phenylsilane as a precursor for SiH, radicals are discussed.

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