The penetration into blind holes of diamond-like carbon films produced by r.f. plasma-assisted CVD

Influence of bias voltage on the structu

Influence of bias voltage on the structure and deposition mechanism of diamond-like carbon films produced by RF (13.56 MHz) CH4 plasma

✍ Ouchabane, M. ;Salah, H. ;Herrmann, M. ;Tabet, N. ;Henda, K. ;Touchrift, B. ;Kec 📂 Article 📅 2010 🏛 John Wiley and Sons 🌐 English ⚖ 575 KB

## Abstract Plasma enhanced chemical vapour deposition technique (PECVD) was used to grow diamond‐like carbon films using pure methane gas plasma. Structural, optical and mechanical properties of the obtained a‐C:H films were investigated as a function of bias voltage in the range 120–270 V, using