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The optimization of incident angles of low-energy oxygen ion beams for increasing sputtering rate on silicon samples

✍ Scribed by T. Sasaki; N. Yoshida; M. Takahashi; M. Tomita


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
458 KB
Volume
255
Category
Article
ISSN
0169-4332

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