Application of ion-beam etching techniqu
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Yonehara, Katsuhisa ;Baba, Norio ;Kanaya, Koichi
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Article
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1989
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Wiley (John Wiley & Sons)
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English
β 801 KB
The term "etching," in electron microscopy, refers to the removal of specimen surface layers and includes chemical, electrolytic, and ion-beam methods. The ion-beam etching process is used to remove layers of a target material by bombarding it with ionized gas molecules. Recently, the method has bee