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The mechanism of formation of microneedles on the silicon surface in fluorinated plasma via the cyclic etching-deposition process

✍ Scribed by I. I. Amirov; A. S. Shumilov

Book ID: 110164693
Publisher: SP MAIK Nauka/Interperiodica
Year: 2008
Tongue: English
Weight: 303 KB
Volume: 42
Category: Article
ISSN: 0018-1439
DOI: 10.1134/s0018143908050111

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