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The mechanism of field-assisted silicon-glass Bonding

✍ Scribed by Yozo Kanda; Kazunori Matsuda; Chizuko Murayama; Junko Sugaya


Book ID
118414990
Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
404 KB
Volume
23
Category
Article
ISSN
0924-4247

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## Abstract The morphology of metal‐assisted electroless etched n‐type silicon in HF–oxidizing agent–H~2~O etching system as a function of oxidizing type and etching time was studied. Three types of oxidizing agent were investigated: Na~2~S~2~O~8~, K~2~Cr~2~O~7~ and KMnO~4~. The layers formed on si