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The interaction between Xe and F in Si (1 0 0) pre-amorphised with 20 keV Xe and implanted with low energy BF2

✍ Scribed by M. Werner; J.A. van den Berg; D.G. Armour; G. Carter; T. Feudel; M. Herden; M. Bersani; D. Giubertoni; P. Bailey; T.C.Q. Noakes


Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
151 KB
Volume
114-115
Category
Article
ISSN
0921-5107

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