The initial photochemical process of triosmiumdodecacarbonyl adsorbed on the surface of silica as studied by picosecond diffuse reflectance laser photolysis and matrix isolation
✍ Scribed by Sadaaki Yamamoto; Hirokazu Mizuma; Atsuhiko Nitta; Norimasa Fukazawa; Hiroshi Fukumura; Hiroshi Masuhara
- Publisher
- Elsevier Science
- Year
- 1993
- Tongue
- English
- Weight
- 512 KB
- Volume
- 215
- Category
- Article
- ISSN
- 0009-2614
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✦ Synopsis
The transient absorption spectrum of the coordinatively unsaturated trinuclear osmium carbonyl cluster Os3 (CO), , adsorbed on the surface of silica was observed for the first time by the ps time-resolved diffuse reflectance laser photolysis of Os,(CO) i2. The present results demonstrated that OS~(CO)~, is the photoprimary product responsible for the net oxidative addition of surface hydroxyls to Oss(C0) r2 adsorbed on the surface of silica to form the surface attached trinuclear species HOss(C0) rc-OSi=.
It was revealed that the addition of surface hydroxyls to Osl (CO), , is completed within the time of our instrumental response ( 6 35 ps), which is comparable to the coordination of solvent to coordinatively unsaturated metal carbonyls.