✦ LIBER ✦
The influence of polysilicon gate morphology on dopant activation and deactivation kinetics in deep-submicron CMOS transistors
✍ Scribed by F.N. Cubaynes; P.A. Stolk; J. Verhoeven; F. Roozeboom; P.H. Woerlee
- Publisher
- Elsevier Science
- Year
- 2001
- Tongue
- English
- Weight
- 282 KB
- Volume
- 4
- Category
- Article
- ISSN
- 1369-8001
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