๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

The influence of oxidation and high temperature treatment on MOS device characteristics

โœ Scribed by Revesz, A.G.; Zaininger, K.H.

Book ID
114588884
Publisher
IEEE
Year
1965
Tongue
English
Weight
363 KB
Volume
12
Category
Article
ISSN
0018-9383

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

High temperature oxidation of FeCrAl-all
High temperature oxidation of FeCrAl-alloys โ€“ influence of Al-concentration on oxide layer characteristics
โœ J. Engkvist; U. Bexell; M. Grehk; M. Olsson ๐Ÿ“‚ Article ๐Ÿ“… 2009 ๐Ÿ› John Wiley and Sons ๐ŸŒ German โš– 534 KB

## Abstract The superior high temperature oxidation resistance of FeCrAl alloys relies on the formation of a dense and continuous protective aluminium oxide layer on the alloy surface when exposed to high temperatures. Consequently, the aluminium content, i.e. the aluminium concentration at the all