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The influence of deposition temperature on the electrical resistance of thin Cu films

✍ Scribed by W. Schlemminger; D. Stark

Publisher: Elsevier Science
Year: 1987
Weight: 48 KB
Volume: 189-190
Category: Article
ISSN: 0167-2584
DOI: 10.1016/0167-2584(87)90566-4

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