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The influence of DC biasing on the uniformity of a-C:H films for three-dimensional substrates by using a plasma-based ion implantation technique

✍ Scribed by Toshiya Watanabe; Kazuhiro Yamamoto; Osamu Tsuda; Akihiro Tanaka; Yoshinori Koga; Osamu Takai


Book ID
114167203
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
507 KB
Volume
206
Category
Article
ISSN
0168-583X

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