✦ LIBER ✦
The incorporation of heavy metals into diazo-type electron beam resists
✍ Scribed by Lewis, C. R.
- Publisher
- John Wiley and Sons
- Year
- 1983
- Weight
- 357 KB
- Volume
- 21
- Category
- Article
- ISSN
- 0360-6376
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✦ Synopsis
Abstract
Metals may be chemically incorporated into organic lithographic resists that contain or can be functionalized with OH groups. A wide range of metal incorporation (0.04–12% of total solids by weight) has been demonstrated for AZ‐1370 (Shipley), a diazo‐type photo‐ and electron resist. The novolac component of the resist is reacted with an organometallic halide, R~y~MX (R = alkyl, aryl; M = transition or main group metal; X = CI, Br; 1 ≤ y ≤ 4, depending on M) to introduce the corresponding organometallic function into the resist.