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The importance of organosilane polymer photo-oxidation in resist pattern fabrication

✍ Scribed by Hiroshi Ban; Ken Sukegawa

Publisher: John Wiley and Sons
Year: 1987
Tongue: English
Weight: 367 KB
Volume: 33
Category: Article
ISSN: 0021-8995
DOI: 10.1002/app.1987.070330813

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