✦ LIBER ✦
The implanted profiles of boron, phosphorus and arsenic in silicon from junction depth measurements : D. E. Davies, Solid-St. Electron.13 (1970), p. 229
- Publisher
- Elsevier Science
- Year
- 1970
- Tongue
- English
- Weight
- 206 KB
- Volume
- 9
- Category
- Article
- ISSN
- 0026-2714
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