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The impact of pseudomorphic AlAs spacer layers on the gate leakage current of InAl As/InGaAs heterostructure field-effect transistors

✍ Scribed by U. Auer; R. Reuter; P. Ellrodt; C. Heedt; W. Prost; F. J. Tegude


Publisher
John Wiley and Sons
Year
1996
Tongue
English
Weight
420 KB
Volume
11
Category
Article
ISSN
0895-2477

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✦ Synopsis


InP-based heterostmcture field-effect transistor, gate leakage current, impact ionization, channel-to-gate transfer rate of holes, pseudomorphic AlAs-spacer layer