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The impact of ion implantation on silicon device and circuit technology : H. G. Dill, R. M. Finnila, A. M. Leupp and T. N. Toombs. Solid St. Technol., December (1972), p. 27


Book ID
103270689
Publisher
Elsevier Science
Year
1973
Tongue
English
Weight
222 KB
Volume
12
Category
Article
ISSN
0026-2714

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