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The growth of nanometer Si/SiGe/Si quantum well wires with local molecular beam epitaxy in dependence on the shadow mask geometry

✍ Scribed by Myeongcheol Kim; H.J. Osten; A. Wolff; C. Quick; H.P. Zeindl; J. Klatt; D. Knoll


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
562 KB
Volume
167
Category
Article
ISSN
0022-0248

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