The Ge condensation technique: A solution for planar SOI/GeOI co-integration for advanced CMOS technologies?

✍ Scribed by B. Vincent; J.F. Damlencourt; Y. Morand; A. Pouydebasque; C. Le Royer; L. Clavelier; N. Dechoux; P. Rivallin; T. Nguyen; S. Cristoloveanu; Y. Campidelli; D. Rouchon; M. Mermoux; S. Deleonibus; D. Bensahel; T. Billon

• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 814 KB
• Volume: 11
• Category: Article
• ISSN: 1369-8001
• DOI: 10.1016/j.mssp.2008.10.005