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The formation of various nickel-silicon compounds by ion beam mixing: H Kheyrandish, G A Stephens and J S Colligon,The Centre for Thin Film and Surface Research, University of Salford, Salford M5 4WT, UK


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
136 KB
Volume
39
Category
Article
ISSN
0042-207X

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