The Formation of Ordered Nanoholes in Binary, Chemically Similar, Symmetric Diblock Copolymer Blend Films
✍ Scribed by Yu Xuan; Juan Peng; Hanfu Wang; Binyao Li; Yanchun Han
- Publisher
- John Wiley and Sons
- Year
- 2004
- Tongue
- English
- Weight
- 212 KB
- Volume
- 25
- Category
- Article
- ISSN
- 1022-1336
No coin nor oath required. For personal study only.
✦ Synopsis
Abstract
Summary: Binary symmetric diblock copolymer blends, that is, low‐molecular‐weight poly(styrene‐block‐methyl methacrylate) (PS‐b‐PMMA) and high‐molecular‐weight poly(styrene‐block‐methacrylate) (PS‐b‐PMA), self‐assemble on silicon substrates to form structures with highly ordered nanoholes in thin films. As a result of the chemically similar structure of the PMA and the PMMA block, the PMMA chain penetrates through the large PMA block that absorbs preferentially on the polar silicon substrate. This results in the formation of nanoholes in the PS continuous matrix.
An atomic force microscopy image of the thin film obtained from the blend of low‐molecular‐weight PS‐b‐PMMA and high‐molecular‐weight PS‐b‐PMA. The regular array of nanoholes in the films surface is clearly visible.
imageAn atomic force microscopy image of the thin film obtained from the blend of low‐molecular‐weight PS‐b‐PMMA and high‐molecular‐weight PS‐b‐PMA. The regular array of nanoholes in the films surface is clearly visible.