✦ LIBER ✦
The formation of an amorphous silicide by thermal reaction of sputter-deposited Ti and Si layers: Ivo J M M Raajimakers et al, J appl Phys, 63, 1988, 2790–2795
- Publisher
- Elsevier Science
- Year
- 1989
- Tongue
- English
- Weight
- 156 KB
- Volume
- 39
- Category
- Article
- ISSN
- 0042-207X
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