✦ LIBER ✦

The Etching of Ti Adhesion Layers in H[sub 2]O[sub 2] Solutions

✍ Scribed by van den Meerakker, J. E. A. M.; Metsemakers, J. P.; Giesbers, J. B.

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Selective Etching of Gallium Arsenide Cr

✍ Iida, Shinya; Ito, Kazuhiro 📂 Article 📅 1971 🏛 The Electrochemical Society 🌐 English ⚖ 472 KB

A New Etching Solution System, H[sub 3]P

✍ Mori, Yoshifumi 📂 Article 📅 1978 🏛 The Electrochemical Society 🌐 English ⚖ 906 KB

Stain Etching Characteristics of Silicon

✍ Hoshino, Daisuke; Adachi, Sadao 📂 Article 📅 2007 🏛 The Electrochemical Society 🌐 English ⚖ 496 KB

The etching of Ti-W in concetrated H2O2

✍ J.E.A.M. van den Meerakker; M. Scholten; J.J. van Oekel 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 696 KB

H[sub 2]O[sub 2] Decomposition Reaction

✍ Giordani, V.; Freunberger, S. A.; Bruce, P. G.; Tarascon, J.-M.; Larcher, D. 📂 Article 📅 2010 🏛 The Electrochemical Society 🌐 English ⚖ 196 KB

Enhancement of the Fluoride Vacancy Cond

✍ Hariharan, K. 📂 Article 📅 1995 🏛 The Electrochemical Society 🌐 English ⚖ 583 KB