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The Enhanced Role of Shallow-Trench Isolation in Ionizing Radiation Damage of 65 nm RF-CMOS on SOI

✍ Scribed by Madan, Anuj; Verma, Rohan; Arora, Rajan; Wilcox, Edward P.; Cressler, John D.; Marshall, Paul W.; Schrimpf, Ronald D.; Cheng, Peter F.; Del Castillo, Linda Y.; Liang, Qingqing; Freeman, Greg

Book ID: 118049185
Publisher: IEEE
Year: 2009
Tongue: English
Weight: 924 KB
Volume: 56
Category: Article
ISSN: 0018-9499
DOI: 10.1109/tns.2009.2033998

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