𝔖 Bobbio Scriptorium
✦   LIBER   ✦

The electrical properties of phosphorous doped silicon layers obtained by ion implantation through a passivating oxide : J. Verjans, R. Van Overstraeten, H. Patt and R. De Keersmaecker. Solid St. Electron. 16 (1973), p. 779


Publisher
Elsevier Science
Year
1973
Tongue
English
Weight
169 KB
Volume
12
Category
Article
ISSN
0026-2714

No coin nor oath required. For personal study only.