𝔖 Bobbio Scriptorium
✦   LIBER   ✦

The electrical and optical properties of direct-patternable SnO2 thin films containing Pt nanoparticles at various annealing temperatures

✍ Scribed by Yong-June Choi; Hyung-Ho Park; Stephen Golledge; David C. Johnson; Ho Jung Chang; Hyeongtag Jeon


Publisher
Elsevier Science
Year
2010
Tongue
English
Weight
744 KB
Volume
205
Category
Article
ISSN
0257-8972

No coin nor oath required. For personal study only.

✦ Synopsis


The optical and electrical characteristics of SnO 2 films with 0.02 at.% Pt nanoparticles were studied after annealing at various temperatures. Pt nanoparticles were synthesized by a methanol reduction method and their size was limited to 3 nm on average using PVP [poly(N-vinyl-2-pyrrolidone)] as a protecting agent. The electrical conduction of the SnO 2 films was enhanced by the introduction of Pt nanoparticles without degradation of optical transmittance. The resistivity and transmittance of the SnO 2 films with and without Pt nanoparticles after annealing at 700 °C were 2.9 × 10 -2 Ω cm and 86.45%, and 1.5 × 10 -1 Ω cm and 85.75%, respectively. The observed enhancement in electrical properties was attributed to an increase in carrier concentration due to the addition of Pt nanoparticles. The fact that almost no change in transmittance was observed is explained by the small quantities produced and small particle sizes of the Pt nanoparticles. Welldefined 30-μm-wide direct-patterned SnO 2 films containing Pt nanoparticles were formed by photochemical metal-organic deposition using a simple process including a photosensitive starting precursor, UV exposure, and removal of the un-patterned area with solvent rinsing.


📜 SIMILAR VOLUMES


Correlation Between the Electrical Prope
✍ F. Fabreguette; L. Imhoff; M. Maglione; B. Domenichini; M. C. Marco de Lucas; P. 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 616 KB

Titanium oxynitride (TiN x O y ) thin films were deposited by low-pressure metal±organic CVD (LP-MOCVD) on (100) silicon, sapphire, and polycrystalline alumina substrates. Titanium isopropoxide (TIP) and ammonia were used as precursors. The influence of the growth temperature, ranking from 450 C to