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The effects of boron in the Cu(B)/Ti/SiO2system on the Cu-Ti reaction, resistivity, and diffusion barrier properties

✍ Scribed by H. J. Yang; S. Lee; J. B. Park; H. M. Lee; E. G. Lee; C. M. Lee; H. N. Hong; S. Mori; J. H. Lee; J. G. Lee

Publisher
Springer US
Year
2005
Tongue
English
Weight
681 KB
Volume
34
Category
Article
ISSN
0361-5235

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