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The effects of a sacrificial oxide process on metal-oxide-semiconductor field effect transistors fabricated with ion-beam-nitridation technology : Han-Sheng Lee. Solid-St. Electron.29 (1), 25 (1986)


Publisher
Elsevier Science
Year
1987
Tongue
English
Weight
120 KB
Volume
27
Category
Article
ISSN
0026-2714

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