The effect of underlying oxide layer thickness on in- process monitoring for polycrystalline silicon deposition

✍ Scribed by Takao Ando; Norihiro Tokura

• Publisher: Elsevier Science
• Year: 1979
• Tongue: English
• Weight: 261 KB
• Volume: 62
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(79)90309-2