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The effect of Ti ions implantation on the structure of anodic alumina films

✍ Scribed by N.N Cherenda; V.V Uglov; G.V Litvinovich; A.L Danilyuk


Book ID
114167469
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
415 KB
Volume
211
Category
Article
ISSN
0168-583X

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Effects of ion implantation on structure
✍ H. Watanabe; M. Iwaki πŸ“‚ Article πŸ“… 2009 πŸ› Elsevier Science 🌐 English βš– 492 KB

A Raman spectroscopic study has been carried out on the effects of ion implantation of argon or nitrogen on the structures of ion-plated (IP) carbon films. The carbon films were deposited on WC substrates at room temperature, 200, 250, 300 and 350 Β°C. Implantation of 150 keV Ar + or N into the films