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The effect of process parameters on dc self-bias voltage in reactive ion etching of GaAs using CH4/H2

✍ Scribed by H.F. Sahafi; A.P. Webb; M.A. Carter; G.F. Goldspink


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
317 KB
Volume
25
Category
Article
ISSN
0026-2692

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