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The Effect of Power Discharge on the Acid-Base Properties of Thin Films Deposited from Hydroxyethylmethacrylate Plasma

โœ Scribed by M. Morra; E. Occhiello; F. Garbassi


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
402 KB
Volume
164
Category
Article
ISSN
0021-9797

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โœ Kazunori Moriki; Tetsuji Satoh; Atsushi Itabashi; Motoshige Yumoto ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› Wiley (John Wiley & Sons) ๐ŸŒ English โš– 454 KB ๐Ÿ‘ 2 views

## Abstract Plasma CVD is a candidate technology for the fabrication of optical polymer waveguides. It can deposit a film on any surface geometry and any substrate material at a temperature under 200 ยฐC in a vacuum process. It also provides good thickness controllability and uniformity of the depos