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The effect of oxygen rf discharge on pulsed laser deposition of oxide films

โœ Scribed by A. De Giacomo; O. De Pascale


Publisher
Springer
Year
2004
Tongue
English
Weight
349 KB
Volume
79
Category
Article
ISSN
1432-0630

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Effects of oxygen pressures on pulsed la
โœ Z.G. Zhang; F. Zhou; X.Q. Wei; M. Liu; G. Sun; C.S. Chen; C.S. Xue; H.Z. Zhuang; ๐Ÿ“‚ Article ๐Ÿ“… 2007 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 421 KB

Zinc oxide (ZnO) thin films on Si (1 1 1) substrates were deposited by pulsed laser ablation of ZnO target at different oxygen pressures. A pulsed Nd:YAG laser with wavelength of 1064 nm was used as laser source. The deposited thin films have been characterized by X-ray diffraction (XRD), Atomic for