The effect of light irradiation on electrons and holes trapping in nonvolotile memory capacitors employing sub 10 nm SiO2–HfO2 stacks and Au nanocrystals

✍ Scribed by V. Mikhelashvili; B. Meyler; M. Garbrecht; T. Cohen-Hyams; Y. Roizin; M. Lisiansky; W.D. Kaplan; Y. Salzman; G. Eisenstein

• Publisher: Elsevier Science
• Year: 2011
• Tongue: English
• Weight: 719 KB
• Volume: 88
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2010.12.030