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The effect of germane variation on microstructure in polycrystalline Si/Si 1-x Ge x thin films grown by rapid thermal chemical vapour deposition: fractal characterisation using scanning probe microscopy

✍ Scribed by Campbell, P.A.; McNeill, D.W.; Walmsley, D.G.; Chong, R.L.F.; Gay, D.; Gamble, H.S.


Book ID
113035407
Publisher
Springer
Year
1998
Tongue
English
Weight
671 KB
Volume
66
Category
Article
ISSN
1432-0630

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